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國立雲林科技大學貴重儀器共同使用計畫
Advanced Instrumentation Center
| ATOMIC FORCE MICROSCOPE | Advanced Instrumentation Center | 原子力顯微鏡 ( Atomic Force Microscope ) 是利用奈米尺寸的探針在樣品表面做掃瞄,藉由原子之間的凡得瓦爾作用力產生接觸與排斥現象、再配合探針懸臂 ( cantilever ) 作為雷射光的反射介面,當探針因表面作用吸引排斥而導致雷射的偏移量,記錄這些偏移數值即可呈現出樣品的表面形貌。近年來AFM開發很多的量測應用:如電性、磁性等,這些都必須搭配各式的探針與模組方能進行量測,根據其成像原理和操作模式的差異,以分析奈米材料表面形貌、表面粗糙度、尺度、電性、硬度、黏滯力等。涵蓋了聚合物材料表面結構、整合光路測量、材料力學性能特性、MEMS製程分析、細胞表面形態、結構觀察、資料儲存、液晶材料性能特性、生物感測器、分子自組裝結構、能源等領域的監測。
儀器規格 1. 影像掃描解析度:1nm
2. 掃描範圍:90 × 90 × 10μm
3. 樣品載台:最大直徑210mm,厚度15mm
儀器服務項目 1. 表面形貌掃描模式 (空氣、液相):Contact Mode (接觸模式)、Tapping Mode (輕敲接觸模式)、 ScanAsyst Mode (智能
掃描模式)
2. Lateral Force Microscopy, LFM (側向力顯微技術):表面摩擦力、表面彈性係數
3. CAFM (導電顯微技術):電壓、電流、電阻
4. PeakForce QNM:楊氏模量 、吸附力、耗散能和形變
5. 靜電力顯微技術(Electric Field Microscopy,EFM):表面靜電位能,電荷分布以及電荷輸運
6. 磁力顯微技術(Magnetic Force Microscopy,MFM):重構樣品表面的磁性結構
7. 表面電位顯微技術(Kelvin Probe Force Microscopy):材料功函數 (Work Function)
8. 壓電響應顯微技術(Piezoresponse Force Microscopy,PFM):壓電材料形變
量測模式介紹:https://reurl.cc/vkGWrN |
Instrument Chinese Name
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【EM025500】原子力顯微鏡(多功能掃描式探針顯微鏡)
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【EM025500】原子力顯微鏡(多功能掃描式探針顯微鏡)
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Instrument English Name
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ATOMIC FORCE MICROSCOPE
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Instrument Category
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Electron Microscope
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Instrument Status
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服務(On Service)
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Number of Reservations
(within a month)
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Number of Reservations(Internal):0
Number of Reservations(external):0
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Billing Trial Calculation
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Basic | 113 | Surface topography scan |
| Surface topography scan | 600 | 1,500 | 0 | 0 | No discount |
| 3小時為一個時段,不足1時段仍以全時段計費
3 hours is a time period, less than 1 time period is still billed for the whole time period |
Basic | 113 | Mechanical properties, electrical properties and liquid phase scanning |
| Mechanical properties, electrical properties and liquid phase scanning | 700 | 1,750 | 0 | 0 | No discount |
| LFM、CAFM、PeakForce QNM、EFM、MFM、KPPFM、PFM
3小時為一個時段,不足1時段仍以全時段計費
3 hours is a time period, less than 1 time period is still billed for the whole time period |
Basic | 113 | Buy the original general probe |
| Buy the original general probe | 1,500 | 1,500 | 0 | 0 | No discount |
| 此為參考售價,實際價格依選購探針價格決定。
This is the reference price, and the actual price is determined by the price of the probe selected. |
Basic | 113 | Buy the original modulus probe |
| Buy the original modulus probe | 2,100 | 2,100 | 0 | 0 | No discount |
| 此為參考售價,實際價格依選購探針價格決定。
This is the reference price, and the actual price is determined by the price of the probe selected. |
Basic | 113 | Buy the original electrical probe |
| Buy the original electrical probe | 2,500 | 2,500 | 0 | 0 | No discount |
| 此為參考售價,實際價格依選購探針價格決定。
This is the reference price, and the actual price is determined by the price of the probe selected. |
Basic | 113 | Data processing fees |
| Data processing fees | 100 | 100 | 0 | 0 | No discount |
| 費用依實驗量測數據影像張數離線處理計算,自行處理數據不計費。
The charge is calculated based on the offline processing images number of the experimental measurement data, and there is no pay for processing the data by yourself. |
Basic | 113 | Surface topography scan (industrial circles) |
| Surface topography scan (industrial circles) | 4,000 | 4,000 | 0 | 0 | No discount |
| 3小時為一個時段,不足1時段仍以全時段計費
3 hours is a time period, less than 1 time period is still billed for the whole time period |
Basic | 113 | Mechanical properties, electrical properties and liquid phase scanning((industrial circles)) |
| Mechanical properties, electrical properties and liquid phase scanning((industrial circles)) | 5,000 | 5,000 | 0 | 0 | No discount |
| LFM、CAFM、PeakForce QNM、EFM、MFM、KPPFM、PFM
3小時為一個時段,不足1時段仍以全時段計費
3 hours is a time period, less than 1 time period is still billed for the whole time period |
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國立雲林科技大學貴重儀器共同使用計畫
Advanced Instrumentation Center
| Field Emission Scanning Electron Microscope | Advanced Instrumentation Center | 由於本儀器為場發射掃描式電子顯微鏡/能量發散光譜儀,高電場所發射之電子束徑小,亮度高,其解析度可高達1.0 nm(15 KV)、2.2 nm(1KV),另可在低電壓(可低至0.5 KV)下操作,具直接觀察非導體之功能。
廠商及型號為日本JEOL JSM-6701F冷陰極(Cold Cathode)場發射掃描式電子顯微鏡。
冷陰極場發射電子槍較其他熱場發射(Thermal)及蕭基(Schottky)電子槍而言,其優點是電子束與能量散佈相當小,且在超高真空下操作,解析度佳。
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Instrument Chinese Name
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【EM011500】場發射掃描式電子顯微鏡
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【EM011500】場發射掃描式電子顯微鏡
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Instrument English Name
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Field Emission Scanning Electron Microscope
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Instrument Category
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Electron Microscope
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Instrument Status
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服務(On Service)
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Number of Reservations
(within a month)
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Number of Reservations(Internal):0
Number of Reservations(external):0
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Billing Trial Calculation
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國立雲林科技大學貴重儀器共同使用計畫
Advanced Instrumentation Center
| Transmission Electron Microscopy | Advanced Instrumentation Center | 1.高解析穿透式電子顯微鏡
加速電壓:200KV
放大倍率:X 30 to 1500K
解像度:Point Resoltion:≦0.23nm;Lattice Resoltion:≦0.14nm
2.能量散射光譜儀(EDS)80mm2 window free active area
Resolution:≦127ev
元素:鈹 ~ 鋂
3.數位影像處理系統 (CMOS)
畫素:3K×3K pixel
4.服務項目:明場影像、暗場影像、選區繞射圖、晶格影像、元素點分析、Mapping、Linescan |
Instrument Chinese Name
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【EM012600】穿透式電子顯微鏡
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【EM012600】穿透式電子顯微鏡
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Instrument English Name
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Transmission Electron Microscopy
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Instrument Category
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Electron Microscope
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Instrument Status
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服務(On Service)
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Number of Reservations
(within a month)
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Number of Reservations(Internal):0
Number of Reservations(external):0
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Billing Trial Calculation
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國立雲林科技大學貴重儀器共同使用計畫
Advanced Instrumentation Center
| Ultra High Resolution Thermal Field Emission Scanning Electron Microscope | Advanced Instrumentation Center | *場發射掃描式電子顯微鏡(FESEM)除了跟傳統掃描式電子顯微鏡相同地可觀察物體之微結構外,因具備高電場所發射之電子束徑小,亮度高,具有傳統掃描式電子顯微鏡所明顯不及之高解析度,其解析度可高達 1nm(15 kV),可直接觀察非導體之樣品。 另外,還加裝了X 光能量散譜儀( X-ray Energy Dispersive Spectrometer, EDS ),可對材料做進一步微區元素定性與定量分析。
*本儀器型號為日本 JEOL JSM-7600F Prime Schottky Field Emission Scanning Electron Microscope(熱場發射掃描式電子顯微鏡)。 |
Instrument Chinese Name
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【EM012200】超高解析熱電子型場發射掃描式電子顯微鏡
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【EM012200】超高解析熱電子型場發射掃描式電子顯微鏡
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Instrument English Name
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Ultra High Resolution Thermal Field Emission Scanning Electron Microscope
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Instrument Category
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Electron Microscope
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Instrument Status
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服務(On Service)
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Number of Reservations
(within a month)
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Number of Reservations(Internal):0
Number of Reservations(external):0
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Billing Trial Calculation
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國立雲林科技大學貴重儀器共同使用計畫
Advanced Instrumentation Center
| X-ray Photoelectron Spectroscopy | Advanced Instrumentation Center | 化學分析電子能譜儀,又稱X射線光電子能譜儀,是用來對物質表面進行定性及定量的化學分析。其基本功能有全能譜圖(Survey)、單元素能譜圖(multiplex)、元素線掃描(line scan)、元素影像掃描(mapping)和成分縱深分析(depth profiling),用以偵測元素化學狀態訊息和百分比的含量。除了以上功能,本設備還配載紫外光電子能譜(UPS)和低能量反轉電子能譜(LEIPS),其特殊功用在於利用紫外光照射樣品所激發出的光電子提供有關價帶的能級信息,並結合經由LEIPS測量得到的電子親和力,能夠進一步求出半導體的能隙。 |
Instrument Chinese Name
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【ESCA001900】X射線光電子能譜儀
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【ESCA001900】X射線光電子能譜儀
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Instrument English Name
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X-ray Photoelectron Spectroscopy
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Instrument Category
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Electron spectrometer
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Instrument Status
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服務(On Service)
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Number of Reservations
(within a month)
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Number of Reservations(Internal):18
Number of Reservations(external):20
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Billing Trial Calculation
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