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逢甲大學自有儀器共同使用計畫
Precision Instrument Support Center
| X-ray photoelectron spectroscopy | Precision Instrument Support Center | 1.鋁單光X光源系統：X射線束最小直徑 ≦ 10 µm
2.能量解析度：0.5 eV (Ag3d5/2)
3.試片定位：SXI成像, Ø 10 µm ~ 1400 µm×1400 µm
4.試片大小： 10mm*10mm*5mm
5.雙射束源電荷補償系統：PET中O=C-O C1s半高寬< 0.85 eV
6.Zalar rotation depth profiling (迴旋式縱深分析)
7.UPS: Ultraviolet Photoelectron Spectroscopy (紫外光電子能譜)
8.LEIPS: Low Energy Inverse Photoelectron Spectroscopy(低能量反光電子能譜)
9.Argon Ion Gun，可作清潔 sample 的表面和 depth profile 分析。
10.Ar Gas Cluster Ion Gun(GCIB)，可作有機物 depth profile 分析。 |
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Instrument Chinese Name
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【ESCA003900】X 光光電子能譜儀
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【ESCA003900】X 光光電子能譜儀
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Instrument English Name
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X-ray photoelectron spectroscopy
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Instrument Category
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Electron spectrometer
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Instrument Status
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服務(On Service)
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Number of Reservations
(within a month)
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Number of Reservations(Internal):20
Number of Reservations(external):18
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Billing Trial Calculation
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| Basic | 113 | XPS analysis |
| XPS analysis | 500 | 5,000 | 500 | 5,000 | No discount |
| XPS分析含Surface Survey and Narrow Scan 量測，每個序號至多分析6個樣品，使用費含樣品處理、抽真空、開關機及數據轉檔時間；量測皆為以委託操作為主，並不提供數據分析。 |
| Basic | 113 | Deep analysis - Ar ion gun |
| Deep analysis - Ar ion gun | 600 | 6,000 | 600 | 6,000 | No discount |
| 含XPS分析費外，需加收此項費用。 不滿一小時，以一小時為計算。 |
| Basic | 113 | Deep analysis - GCIB ion gun |
| Deep analysis - GCIB ion gun | 650 | 6,500 | 650 | 6,500 | No discount |
| 含XPS分析費外，需加收此項費用。 不滿一小時，以一小時為計算。 |
| Basic | 113 | Ultraviolet Photoelectron Spectroscopy (UPS) |
| Ultraviolet Photoelectron Spectroscopy (UPS) | 300 | 3,500 | 300 | 3,500 | No discount |
| 含XPS分析費外，需加收此項費用。 不滿一小時，以一小時為計算。 |
| Basic | 113 | Low Energy Inverse Photoelectron Spectroscopy (LEIPS) |
| Low Energy Inverse Photoelectron Spectroscopy (LEIPS) | 500 | 5,000 | 500 | 5,000 | No discount |
| 含XPS分析費外，需加收此項費用。 不滿一小時，以一小時為計算。 |
| Basic | 113 | sample production fee |
| sample production fee | 200 | 200 | 200 | 200 | No discount |
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逢甲大學自有儀器共同使用計畫
Precision Instrument Support Center
| Cold Emission Scanning Electron Microscope | Precision Instrument Support Center | 1.電子槍(Electron Gun)：冷陰極場發射式
2.加速電壓：0.5~30kV
3.Secondary electron Image Resolution 二次電子影像解析度
1.0nm guaranteed (accelerating voltage: 15kV, WD: 4mm)。
2.0nm guaranteed (accelerating voltage: 1kV, WD: 1.5 mm)。 |
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Instrument Chinese Name
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【EM0000022100】冷場發射掃描式電子顯微鏡
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【EM0000022100】冷場發射掃描式電子顯微鏡
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Instrument English Name
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Cold Emission Scanning Electron Microscope
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Instrument Category
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Electron Microscope
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Instrument Status
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服務(On Service)
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Number of Reservations
(within a month)
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Number of Reservations(Internal):0
Number of Reservations(external):0
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Billing Trial Calculation
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3
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逢甲大學自有儀器共同使用計畫
Precision Instrument Support Center
| High Resolution X-Ray Diffraction | Precision Instrument Support Center | 1.一般廣角繞射分析
2.多晶及薄膜低掠角繞射
3.殘留應力(Residual stress)
4.極圖組織(Pole figure texture)
5.薄膜全反射分析
6.高解析薄膜分析
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Instrument Chinese Name
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【XRD005200】高解析多功能薄膜Ｘ光分析儀
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【XRD005200】高解析多功能薄膜Ｘ光分析儀
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Instrument English Name
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High Resolution X-Ray Diffraction
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Instrument Category
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X-Ray Diffractometer
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Instrument Status
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服務(On Service)
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Number of Reservations
(within a month)
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Number of Reservations(Internal):29
Number of Reservations(external):20
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Billing Trial Calculation
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